Business  Hours

Mon - Thur: 8 am-5 pm

Fri: 8am-3pm

Sat/Sun Closed

2641 Townsgate rd. Suite #100
Westlake Village, Ca., 93161

Tel: +1-805-496-5031

Fax: +1-805-373-9393
info@nanofilm.com

NANOFILM

Made In  THe

Photoresist Technical Info

For use in "Positive Lithography" our standard photoresist is AZ 1518 & AZTFP650 with thicknesses  @ 5,300Å / 10,000Å . Non-standard thicknesses are 15,000Å/ 20,000Å/ 25,000Å. Utilizing a spin technique to apply the resist which leaves the substrate fringless and with excellent adhesion our substrates have become the standard for photomask blanks.  Baked @ 100° fahrenheit for 30 minutes, this standard procedure can be altered to meet customer specifications.  Click the links below to see technical data on the Photoresist.