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Photomask Blank Process 

Nanofilm CHROME PHOTOPLATES are manufactured with various thickness of chromium metal and positive photoresist thickness. These variations must be considered when establishing the correct process times. This basic process should be used for AZ1500 series photoresist @ 5300Å thickness baked at no less than 103° C for 30 minutes. These plates must be handled in yellow or red safelight conditions. The resist is sensitive to blue-ultraviolet light. It is important to keep your process at a constant temperature for consistency (70F, 21C). Many variables must be considered when processing your blanks, we have provided these steps to aid in the beginning of your own process.

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