Photo Resist Application

Utilizing a spin technique Nanofilm knows how critical resist adhesion can be to your project. With this in mind we have worked with many companies that have had issues with either adhesion or etching, over the years with this help we have perfected our application process. The spinning technique also provides a Fringless application of the resist. Softbake for 30 minutes at 103° centigrade. Each substrate is individually inspected by our highly trained staff and packaged for your project. Please use our "QUOTE" page for pricing and availability.

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